Publications

Summary: IEEE TCAD (17), DAC (9), ICCAD (15), etc.

Books / Book Chapters

 

[B2] Bei Yu, David Z. Pan, “Design for Manufacturability with Advanced Lithography”, Springer, 2016.

 

[B1] Bei Yu, David Z. Pan, “Layout Decomposition for Triple Patterning”, in Encyclopedia of Algorithms, M.-Y. Kao eds., Springer, 2015. (paper)


Journal & Conference Papers

Submitted

  • [J] Meng Li, Bei Yu, Yibo Lin, Xiaoqing Xu, Wuxi Li, David Z. Pan, “A Practical Split Manufacturing Framework for Trojan Prevention via Simultaneous Wire Lifting and Cell Insertion”, under review.

  • [J] Yuzhe Ma, Subhendu Roy, Jin Miao, Jiamin Chen, Bei Yu, “Cross-layer Optimization for High Speed Adders: A Pareto Driven Machine Learning Approach”, under review.

  • [J] Haoyu Yang, Jing Su, Yi Zou, Yuzhe Ma, Bei Yu, Evangeline F. Y. Young, “Layout Hotspot Detection with Feature Tensor Generation and Deep Biased Learning”, under review.

  • [J] Derong Liu, Bei Yu, Vinicius Livramento, Salim Chowdhury, Duo Ding, Huy Vo, Akshay Sharma, David Z. Pan, “Synergistic Topology Generation and Route Synthesis for On-Chip Performance-Critical Signal Groups”, under review.

  • [J] Song Chen, Qi Xu, Bei Yu, “Adaptive 3D-IC TSV Fault Tolerance Structure Generation”, under review.

Accepted

2018


  • [C69] Wei Ye, Meng Li, Kai Zhong, Bei Yu, David Z. Pan, “Power Grid Reduction by Sparse Convex Optimization”, ACM International Symposium on Physical Design (ISPD), Monterey, CA, Mar. 25–28, 2018. (preprint)

  • [C68] Grace Li Zhang, Bing Li, Bei Yu, David Z. Pan, Ulf Schlichtmann, “TimingCamouflage: Improving Circuit Security against Counterfeiting by Unconventional Timing”, IEEE/ACM Proceedings Design, Automation and Test in Eurpoe (DATE), Dresden, Mar. 19–23, 2018. (preprint)

  • [C67] Meng Li, Bei Yu, Yibo Lin, Xiaoqing Xu, Wuxi Li, David Z. Pan, “A Practical Split Manufacturing Framework for Trojan Prevention via Simultaneous Wire Lifting and Cell Insertion”, IEEE/ACM Asian and South Pacific Design Automation Conference (ASPDAC), Jeju Island, Jan. 22–25, 2018. (preprint) (slides)

2017


  • [C57] Hang Zhang, Fengyuan Zhu, Haocheng Li, Evangeline F. Y. Young, Bei Yu, “Bilinear Lithography Hotspot Detection”, ACM International Symposium on Physical Design (ISPD), pp. 7–14, Portland, OR, Mar. 19–22, 2017. (paper) (Best Paper Award)

2016


2015


2014

2013


2012


  • [C13] Bei Yu, Jhih-Rong Gao, Duo Ding, Yongchan Ban, Jae-Seok Yang, Kun Yuan, Minsik Cho, David Z. Pan, “Dealing with IC Manufacturability in Extreme Scaling”, IEEE/ACM International Conference on Computer-Aided Design (ICCAD), pp. 240–242, San Jose, CA, Nov. 5–8, 2012. (paper) (Embedded Tutorial paper)

2011

2010

2009


Dissertation

Newsletters

  • [N2] Bei Yu, Gilda Garreton, David Z. Pan, “Layout Compliance for Triple Patterning Lithography: An Iterative Approach”, SPIE Newsroom.