Publications

Summary: IEEE TCAD (22), DAC (18), ICCAD (15), etc.

Journal & Conference Papers

Accepted

2019


  • [C86] Haoyu Yang, Piyush Pathak, Frank Gennari, Ya-Chieh Lai, Bei Yu, “DeePattern: Layout Pattern Generation with Transforming Convolutional Auto-Encoder”, ACM/IEEE Design Automation Conference (DAC), Las Vegas, NV, June 2–6, 2019.

  • [C85] Yuzhe Ma, Haoxing Ren, Brucek Khailany, Harbinder Sikka, Lijuan Luo, Karthikeyan Natarajan, Bei Yu, “High Performance Graph Convolutional Networks with Applications in Testability Analysis”, ACM/IEEE Design Automation Conference (DAC), Las Vegas, NV, June 2–6, 2019.

  • [C84] Tinghuan Chen, Bingqing Lin, Hao Geng, Bei Yu, “Sensor Drift Calibration via Spatial Correlation Model in Smart Building”, ACM/IEEE Design Automation Conference (DAC), Las Vegas, NV, June 2–6, 2019.

  • [C83] Ran Chen, Wei Zhong, Haoyu Yang, Hao Geng, Xuan Zeng, Bei Yu, “Faster Region-based Hotspot Detection”, ACM/IEEE Design Automation Conference (DAC), Las Vegas, NV, June 2–6, 2019.

  • [C82] Yiyang Jiang, Fan Yang, Hengliang Zhu, Bei Yu, Dian Zhou, Xuan Zeng, “Efficient Layout Hotspot Detection via Binarized Residual Neural Network”, ACM/IEEE Design Automation Conference (DAC), Las Vegas, NV, June 2–6, 2019.

  • [C81] Haocheng Li, Satwik Patnaik, Abhrajit Sengupta, Haoyu Yang, Johann Knechtel, Bei Yu, Evangeline F. Y. Young, Ozgur Sinanoglu, “Attacking Split Manufacturing from a Deep Learning Perspective”, ACM/IEEE Design Automation Conference (DAC), Las Vegas, NV, June 2–6, 2019.

  • [C80] Bentian Jiang, Xiaopeng Zhang, Ran Chen, Gengjie Chen, Peishan Tu, Wei Li, Evangeline F. Y. Young, Bei Yu, “FIT: Fill Insertion Considering Timing”, ACM/IEEE Design Automation Conference (DAC), Las Vegas, NV, June 2–6, 2019.

2018


2017


  • [C57] Hang Zhang, Fengyuan Zhu, Haocheng Li, Evangeline F. Y. Young, Bei Yu, “Bilinear Lithography Hotspot Detection”, ACM International Symposium on Physical Design (ISPD), pp. 7–14, Portland, OR, Mar. 19–22, 2017. (paper) (Best Paper Award)

2016


2015


2014

2013


2012


  • [C13] Bei Yu, Jhih-Rong Gao, Duo Ding, Yongchan Ban, Jae-Seok Yang, Kun Yuan, Minsik Cho, David Z. Pan, “Dealing with IC Manufacturability in Extreme Scaling”, IEEE/ACM International Conference on Computer-Aided Design (ICCAD), pp. 240–242, San Jose, CA, Nov. 5–8, 2012. (paper) (Embedded Tutorial paper)

2011

2010

2009



Books / Book Chapters

 

[B2] Bei Yu, David Z. Pan, “Design for Manufacturability with Advanced Lithography”, Springer, 2016.

 

[B1] Bei Yu, David Z. Pan, “Layout Decomposition for Triple Patterning”, in Encyclopedia of Algorithms, M.-Y. Kao eds., Springer, 2015. (paper)


Dissertation

Newsletters

  • [N2] Bei Yu, Gilda Garreton, David Z. Pan, “Layout Compliance for Triple Patterning Lithography: An Iterative Approach”, SPIE Newsroom.