Summary: IEEE TCAD (21), DAC (11), ICCAD (15), etc.

Journal & Conference Papers

Selected Preprints

  • Haoyu Yang, Shuhe Li, Cyrus Tabery, Bingqing Lin, Bei Yu, “Bridging the Gap Between Layout Pattern Sampling and Hotspot Detection via Batch Active Learning”. (arXiv)

  • Qianru Zhang, Meng Zhang, Tinghuan Chen, Zhifei Sun, Yuzhe Ma, Bei Yu, “Recent Advances in Convolutional Neural Network Acceleration”.

  • Yuzhe Ma, Subhendu Roy, Jin Miao, Jiamin Chen, Bei Yu, “Cross-layer Optimization for High Speed Adders: A Pareto Driven Machine Learning Approach”. (arXiv)


  • [J] Meng Li, Bei Yu, Yibo Lin, Xiaoqing Xu, Wuxi Li, David Z. Pan, “A Practical Split Manufacturing Framework for Trojan Prevention via Simultaneous Wire Lifting and Cell Insertion”, accepted by IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems (TCAD). (preprint)


  • [C75] Bei Yu, Haoyu Yang, “Deep Mask Optimization: From Detection to Automatic Generation”, IEEE International Conference on Solid-State and Integrated Circuit Technology (ICSICT), Qingdao, Oct. 31–Nov. 3, 2018. (Invited Paper)

  • [C74] Hao Geng, Haoyu Yang, Bei Yu, Xingquan Li, Xuan Zeng, “Sparse VLSI Layout Feature Extraction: A Dictionary Learning Approach”, IEEE Computer Society Annual Symposium on VLSI (ISVLSI), Hong Kong, July 9–11, 2018. (Invited Paper)


  • [C57] Hang Zhang, Fengyuan Zhu, Haocheng Li, Evangeline F. Y. Young, Bei Yu, “Bilinear Lithography Hotspot Detection”, ACM International Symposium on Physical Design (ISPD), pp. 7–14, Portland, OR, Mar. 19–22, 2017. (paper) (Best Paper Award)






  • [C13] Bei Yu, Jhih-Rong Gao, Duo Ding, Yongchan Ban, Jae-Seok Yang, Kun Yuan, Minsik Cho, David Z. Pan, “Dealing with IC Manufacturability in Extreme Scaling”, IEEE/ACM International Conference on Computer-Aided Design (ICCAD), pp. 240–242, San Jose, CA, Nov. 5–8, 2012. (paper) (Embedded Tutorial paper)




Books / Book Chapters


[B2] Bei Yu, David Z. Pan, “Design for Manufacturability with Advanced Lithography”, Springer, 2016.


[B1] Bei Yu, David Z. Pan, “Layout Decomposition for Triple Patterning”, in Encyclopedia of Algorithms, M.-Y. Kao eds., Springer, 2015. (paper)



  • [N2] Bei Yu, Gilda Garreton, David Z. Pan, “Layout Compliance for Triple Patterning Lithography: An Iterative Approach”, SPIE Newsroom.