Publications

Summary: IEEE TCAD (15), DAC (9), ICCAD (15), etc.

Books / Book Chapters

 

[B2] Bei Yu, David Z. Pan, “Design for Manufacturability with Advanced Lithography”, Springer, 2016.

 

[B1] Bei Yu, David Z. Pan, “Layout Decomposition for Triple Patterning”, in Encyclopedia of Algorithms, M.-Y. Kao eds., Springer, 2015. (paper)


Journal & Conference Papers

Submitted

  • [J] Yuzhe Ma, Subhendu Roy, Jin Miao, Jiamin Chen, Bei Yu, “Cross-layer Optimization for High Speed Adders: A Pareto Driven Machine Learning Approach”, submitted to IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems (TCAD).

  • [J] Haoyu Yang, Jing Su, Yi Zou, Yuzhe Ma, Bei Yu, Evangeline F. Y. Young, “Layout Hotspot Detection with Feature Tensor Generation and Deep Biased Learning”, submitted to IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems (TCAD).

  • [J] Song Chen, Qi Xu, Bei Yu, “Adaptive 3D-IC TSV Fault Tolerance Structure Generation”, submitted to IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems (TCAD).

  • [J] Jian Kuang, Evangeline F. Y. Young, Bei Yu, “CRMA: Incorporating Cut Redistribution with Mask Assignment to Enable the Fabrication of 1D Gridded Design”, submitted to IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems (TCAD).

  • [J] Xingquan Li, Bei Yu, Jiaojiao Ou, Jianli Chen, David Z. Pan, Wenxing Zhu, “Graph Based Redundant Via Insertion and Guiding Template Assignment for DSA-MP”, submitted to IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems (TCAD).

  • [J] Hang Zhang, Fengyuan Zhu, Bentian Jiang, Haocheng Li, Evangeline F. Y. Young, Bei Yu, “Extreme Bilinear Learning Machine for Lithography Hotspot Detection”, submitted to ACM Transactions on Design Automation of Electronic Systems (TODAES).

  • [J] Gengjie Chen, Chak-Wa Pui, Wing-Kai Chow, Ka-Chun Lam, Jian Kuang, Evangeline F. Y. Young, Bei Yu, “RippleFPGA: Routability-Driven Simultaneous Packing and Placement for Modern FPGAs”, submitted to IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems (TCAD).

Accepted

2018

  • [C68] Meng Li, Bei Yu, Yibo Lin, Xiaoqing Xu, Wuxi Li, David Z. Pan, “A Practical Split Manufacturing Framework for Trojan Prevention via Simultaneous Wire Lifting and Cell Insertion”, IEEE/ACM Asian and South Pacific Design Automation Conference (ASPDAC), Jeju Island, Jan. 22–25, 2018. (preprint)

2017


  • [C67] Moumita Das, Ansuman Banerjee, Bei Yu, Bhaskar Sardar, “A Multi-component Branch Predictor Design for Low Resource Budget Processors”, IEEE International Conference on Cloud Computing Technology and Science (CloudCom), Hong Kong, Dec. 11–14, 2017. (preprint)

  • [C66] Chak-Wa Pui, Gengjie Chen, Yuzhe Ma, Evangeline F. Y. Young, Bei Yu, “Clock-Aware UltraScale FPGA Placement with Machine Learning Routability Prediction”, IEEE/ACM International Conference on Computer-Aided Design (ICCAD), Irvine, CA, Nov. 13–16, 2017. (preprint) (Invited Paper)

  • [C65] Yuzhe Ma, Jhih-Rong Gao, Jian Kuang, Jin Miao, Bei Yu, “A Unified Framework for Simultaneous Layout Decomposition and Mask Optimization”, IEEE/ACM International Conference on Computer-Aided Design (ICCAD), Irvine, CA, Nov. 13–16, 2017. (preprint)

  • [C64] Yuzhe Ma, Xuan Zeng, Bei Yu, “Methodologies for Layout Decomposition and Mask Optimization: A Systematic Review”, IFIP/IEEE International Conference on Very Large Scale Integration (VLSI-SoC), Abu Dhabi, UAE, Oct. 23–25, 2017. (preprint) (Invited Paper)

  • [C63] Cheng Zhuo, Bei Yu, Di Gao, “Accelerating Chip Design with Machine Learning: From Pre-Silicon to Post-Silicon”, IEEE International System-on-Chip Conference (SOCC), Munich, Germany, September 5–8, 2017. (preprint) (Invited Paper)

  • [C62] Haoyu Yang, Yajun Lin, Bei Yu, Evangeline F. Y. Young, “Lithography Hotspot Detection: From Shallow To Deep Learning”, IEEE International System-on-Chip Conference (SOCC), Munich, Germany, September 5–8, 2017. (preprint) (Invited Paper)

  • [C57] Hang Zhang, Fengyuan Zhu, Haocheng Li, Evangeline F. Y. Young, Bei Yu, “Bilinear Lithography Hotspot Detection”, ACM International Symposium on Physical Design (ISPD), pp. 7–14, Portland, OR, Mar. 19–22, 2017. (paper) (Best Paper Award)

2016


2015


2014

2013


2012


  • [C13] Bei Yu, Jhih-Rong Gao, Duo Ding, Yongchan Ban, Jae-Seok Yang, Kun Yuan, Minsik Cho, David Z. Pan, “Dealing with IC Manufacturability in Extreme Scaling”, IEEE/ACM International Conference on Computer-Aided Design (ICCAD), pp. 240–242, San Jose, CA, Nov. 5–8, 2012. (paper) (Embedded Tutorial paper)

2011

2010

2009


Dissertation

Newsletters

  • [N2] Bei Yu, Gilda Garreton, David Z. Pan, “Layout Compliance for Triple Patterning Lithography: An Iterative Approach”, SPIE Newsroom.