Publications

Summary: IEEE TCAD (19), DAC (11), ICCAD (15), etc.

Journal & Conference Papers

Submitted

  • [J] Qianru Zhang, Meng Zhang, Tinghuan Chen, Zhifei Sun, Yuzhe Ma, Bei Yu, “An Overview on Recent Advances for Convolutional Neural Network Acceleration”, under review.

  • [J] Xingquan Li, Bei Yu, Jiaojiao Ou, Jianli Chen, David Z. Pan, Wenxing Zhu, “Graph Based Redundant Via Insertion and Guiding Template Assignment for DSA-MP”, under review.

  • [J] Meng Li, Bei Yu, Yibo Lin, Xiaoqing Xu, Wuxi Li, David Z. Pan, “A Practical Split Manufacturing Framework for Trojan Prevention via Simultaneous Wire Lifting and Cell Insertion”, under review.

  • [J] Yuzhe Ma, Subhendu Roy, Jin Miao, Jiamin Chen, Bei Yu, “Cross-layer Optimization for High Speed Adders: A Pareto Driven Machine Learning Approach”, under review.

  • [J] Haoyu Yang, Jing Su, Yi Zou, Yuzhe Ma, Bei Yu, Evangeline F. Y. Young, “Layout Hotspot Detection with Feature Tensor Generation and Deep Biased Learning”, under review.

Accepted

  • [J] Derong Liu, Bei Yu, Vinicius Livramento, Salim Chowdhury, Duo Ding, Huy Vo, Akshay Sharma, David Z. Pan, “Synergistic Topology Generation and Route Synthesis for On-Chip Performance-Critical Signal Groups”, accepted by IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems (TCAD). (preprint)

2018


  • [C73] Haoyu Yang, Shuhe Li, Yuzhe Ma, Bei Yu, Evangeline F. Y. Young, “GAN-OPC: Mask Optimization with Lithography-guided Generative Adversarial Nets”, ACM/IEEE Design Automation Conference (DAC), San Francisco, CA, June 24–28, 2018. (preprint)

  • [C72] Haocheng Li, Wing-Kai Chow, Gengjie Chen, Evangeline F. Y. Young, Bei Yu, “Routability-Driven and Fence-Aware Legalization for Mixed-Cell-Height Circuits”, ACM/IEEE Design Automation Conference (DAC), San Francisco, CA, June 24–28, 2018. (preprint)

  • [C71] Fengxian Jiao, Sheqin Dong, Bei Yu, Bing Li, Ulf Schlichtmann, “Thermal-Aware Placement and Routing for 3D Optical Networks-on-Chips”, IEEE International Symposium on Circuits and Systems (ISCAS), Florence, May 27–30, 2018. (preprint)

  • [C70] Qi Xu, Song Chen, Bei Yu, Feng Wu, “Memristive Crossbar Mapping for Neuromorphic Computing Systems on 3D IC”, ACM Great Lakes Symposium on VLSI (GLSVLSI), Chicago, IL, May 23–25, 2018. (preprint)

2017


  • [C57] Hang Zhang, Fengyuan Zhu, Haocheng Li, Evangeline F. Y. Young, Bei Yu, “Bilinear Lithography Hotspot Detection”, ACM International Symposium on Physical Design (ISPD), pp. 7–14, Portland, OR, Mar. 19–22, 2017. (paper) (Best Paper Award)

2016


2015


2014

2013


2012


  • [C13] Bei Yu, Jhih-Rong Gao, Duo Ding, Yongchan Ban, Jae-Seok Yang, Kun Yuan, Minsik Cho, David Z. Pan, “Dealing with IC Manufacturability in Extreme Scaling”, IEEE/ACM International Conference on Computer-Aided Design (ICCAD), pp. 240–242, San Jose, CA, Nov. 5–8, 2012. (paper) (Embedded Tutorial paper)

2011

2010

2009



Books / Book Chapters

 

[B2] Bei Yu, David Z. Pan, “Design for Manufacturability with Advanced Lithography”, Springer, 2016.

 

[B1] Bei Yu, David Z. Pan, “Layout Decomposition for Triple Patterning”, in Encyclopedia of Algorithms, M.-Y. Kao eds., Springer, 2015. (paper)


Dissertation

Newsletters

  • [N2] Bei Yu, Gilda Garreton, David Z. Pan, “Layout Compliance for Triple Patterning Lithography: An Iterative Approach”, SPIE Newsroom.