Publications

Summary: IEEE TCAD (33), DAC (20), ICCAD (20), etc.

Journal & Conference Papers

Accepted

  • [J59] Haocheng Li, Wing-Kai Chow, Gengjie Chen, Bei Yu, and Evangeline F.Y. Young, “Pin-Accessible Legalization for Mixed-Cell-Height Circuits”, accepted by IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems (TCAD).

  • [J58] Wei Li, Yuzhe Ma, Qi Sun, Lu Zhang, Yibo Lin, Iris Hui-Ru Jiang, Bei Yu, David Z. Pan, “OpenMPL: An Open Source Layout Decomposer”, accepted by IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems (TCAD).

  • [J55] Ran Chen, Wei Zhong, Haoyu Yang, Hao Geng, Fan Yang, Xuan Zeng, Bei Yu, “Faster Region-based Hotspot Detection”, accepted by IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems (TCAD). (code)

2021

  • [C116] Wei Li, Guojin Chen, Haoyu Yang, Ran Chen, Bei Yu, “Learning Point Clouds in EDA”, ACM International Symposium on Physical Design (ISPD), Mar. 21–Mar. 24, 2021. (Invited Paper)

  • [C115] Ziyang Yu, Guojin Chen, Yuzhe Ma, Bei Yu, “A GPU-enabled Level-Set Method for Mask Optimization”, IEEE/ACM Proceedings Design, Automation and Test in Europe (DATE), Feb. 01–05, 2021.

  • [C114] Qi Sun, Tinghuan Chen, Siting Liu, Jin Miao, Jianli Chen, Hao Yu, Bei Yu, “Correlated Multi-objective Multi-fidelity Optimization for HLS Directives Design”, IEEE/ACM Proceedings Design, Automation and Test in Europe (DATE), Feb. 01–05, 2021. (Best Paper Award Nomination)

  • [C113] Qi Sun, Chen Bai, Hao Geng, Bei Yu, “Deep Neural Network Hardware Deployment Optimization via Advanced Active Learning”, IEEE/ACM Proceedings Design, Automation and Test in Europe (DATE), Feb. 01–05, 2021.

  • [C112] Siting Liu, Qi Sun, Peiyu Liao, Yibo Lin, Bei Yu, “Global Placement with Deep Learning-Enabled Explicit Routability Optimization”, IEEE/ACM Proceedings Design, Automation and Test in Europe (DATE), Feb. 01–05, 2021.

  • [C111] Hongjia Li, Mengshu Sun, Tianyun Zhang, Olivia Chen, Nobuyuki Yoshikawa, Bei Yu, Yanzhi Wang, Yibo Lin, “AQFP-Capable Physical Design Automation”, IEEE/ACM Proceedings Design, Automation and Test in Europe (DATE), Feb. 01–05, 2021.

  • [C110] Zhuolun He, Peiyu Liao, Siting Liu, Yuzhe Ma, Bei Yu, “Physical Synthesis for Advanced Neural Network Processors”, IEEE/ACM Asian and South Pacific Design Automation Conference (ASPDAC), Jan. 18–21, 2021. (paper) (slides) (Invited Paper)

  • [C109] Wei Li, Yuxiao Qu, Gengjie Chen, Yuzhe Ma, Bei Yu, “TreeNet: Deep Point Cloud Embedding for Routing Tree Construction”, IEEE/ACM Asian and South Pacific Design Automation Conference (ASPDAC), Jan. 18–21, 2021. (paper) (slides) (Best Paper Award)

  • [C108] Tinghuan Chen, Qi Sun, Canhui Zhan, Changze Liu, Huatao Yu, Bei Yu, “Analog IC Aging-induced Degradation Estimation via Heterogeneous Graph Convolutional Networks”, IEEE/ACM Asian and South Pacific Design Automation Conference (ASPDAC), Jan. 18–21, 2021. (paper) (slides)

  • [C107] Haoyu Yang, Shifan Zhang, Kang Liu, Siting Liu, Benjamin Tan, Ramesh Karri, Siddharth Garg, Bei Yu, Evangeline F.Y. Young, “Attacking a CNN-based Layout Hotspot Detector Using Group Gradient Method”, IEEE/ACM Asian and South Pacific Design Automation Conference (ASPDAC), Jan. 18–21, 2021. (paper) (slides)


2020


2019

  • [C80] Bentian Jiang, Xiaopeng Zhang, Ran Chen, Gengjie Chen, Peishan Tu, Wei Li, Evangeline F. Y. Young, Bei Yu, “FIT: Fill Insertion Considering Timing”, ACM/IEEE Design Automation Conference (DAC), pp. 221:1–221:6, Las Vegas, NV, June 2–6, 2019. (paper) (slides) (poster)


2018


2017

  • [C57] Hang Zhang, Fengyuan Zhu, Haocheng Li, Evangeline F. Y. Young, Bei Yu, “Bilinear Lithography Hotspot Detection”, ACM International Symposium on Physical Design (ISPD), pp. 7–14, Portland, OR, Mar. 19–22, 2017. (paper) (Best Paper Award)


2016


2015


2014

2013


2012

  • [C13] Bei Yu, Jhih-Rong Gao, Duo Ding, Yongchan Ban, Jae-Seok Yang, Kun Yuan, Minsik Cho, David Z. Pan, “Dealing with IC Manufacturability in Extreme Scaling”, IEEE/ACM International Conference on Computer-Aided Design (ICCAD), pp. 240–242, San Jose, CA, Nov. 5–8, 2012. (paper) (Embedded Tutorial paper)


2011

2010

2009



Books / Book Chapters

 

[B3] Shiyan Hu, Bei Yu, “Big Data Analytics for Cyber-Physical Systems”, Springer, 2020.

 

[B2] Bei Yu, David Z. Pan, “Design for Manufacturability with Advanced Lithography”, Springer, 2016.

 

[B1] Bei Yu, David Z. Pan, “Layout Decomposition for Triple Patterning”, in Encyclopedia of Algorithms, M.-Y. Kao eds., Springer, 2015. (paper)


Dissertation

Newsletters

  • [N2] Bei Yu, Gilda Garreton, David Z. Pan, “Layout Compliance for Triple Patterning Lithography: An Iterative Approach”, SPIE Newsroom.