Publications

Summary: IEEE TCAD (22), DAC (11), ICCAD (15), etc.

Journal & Conference Papers

Selected Preprints

  • Yuzhe Ma, Ran Chen, Wei Li, Fanhua Shang, Wenjian Yu, Minsik Cho, Bei Yu, “A Unified Approximation Framework for Deep Neural Networks”. (arXiv)

  • Haoyu Yang, Shuhe Li, Cyrus Tabery, Bingqing Lin, Bei Yu, “Bridging the Gap Between Layout Pattern Sampling and Hotspot Detection via Batch Active Learning”. (arXiv)

  • Qi Sun, Yibo Lin, Iris Hui-Ru Jiang, Bei Yu, David Z. Pan, “OpenMPL: An Open Source Layout Decomposer”. (arXiv) (code)

Accepted

  • [J] Yuzhe Ma, Subhendu Roy, Jin Miao, Jiamin Chen, Bei Yu, “Cross-layer Optimization for High Speed Adders: A Pareto Driven Machine Learning Approach”, accepted by IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems (TCAD). (arXiv)

2019

  • [C78] Haoyu Yang, Piyush Pathak, Frank Gennari, Ya-Chieh Lai, Bei Yu, “Detecting Multi-Layer Layout Hotspots with Adaptive Squish Patterns”, IEEE/ACM Asian and South Pacific Design Automation Conference (ASPDAC), Tokyo, Jan. 21–24, 2019. (Invited Paper)

  • [C77] Xingquan Li, Bei Yu, Jianli Chen, Wenxing Zhu, “A Local Optimal Method on DSA Guiding Template Assignment with Redundant/Dummy Via Insertion”, IEEE/ACM Asian and South Pacific Design Automation Conference (ASPDAC), Tokyo, Jan. 21–24, 2019. (Invited Paper)

  • [C76] Hao Geng, Haoyu Yang, Yuzhe Ma, Joydeep Mitra, Bei Yu, “SRAF Insertion via Supervised Dictionary Learning”, IEEE/ACM Asian and South Pacific Design Automation Conference (ASPDAC), Tokyo, Jan. 21–24, 2019.

  • [C75] Zheng Zhao, Derong Liu, Meng Li, Zhoufeng Ying, Biying Xu, Lu Zhang, Bei Yu, Ray T. Chen, David Z. Pan, “Hardware-software Co-design of Slimmed Optical Neural Networks”, IEEE/ACM Asian and South Pacific Design Automation Conference (ASPDAC), Tokyo, Jan. 21–24, 2019.

2018


2017


  • [C57] Hang Zhang, Fengyuan Zhu, Haocheng Li, Evangeline F. Y. Young, Bei Yu, “Bilinear Lithography Hotspot Detection”, ACM International Symposium on Physical Design (ISPD), pp. 7–14, Portland, OR, Mar. 19–22, 2017. (paper) (Best Paper Award)

2016


2015


2014

2013


2012


  • [C13] Bei Yu, Jhih-Rong Gao, Duo Ding, Yongchan Ban, Jae-Seok Yang, Kun Yuan, Minsik Cho, David Z. Pan, “Dealing with IC Manufacturability in Extreme Scaling”, IEEE/ACM International Conference on Computer-Aided Design (ICCAD), pp. 240–242, San Jose, CA, Nov. 5–8, 2012. (paper) (Embedded Tutorial paper)

2011

2010

2009



Books / Book Chapters

 

[B2] Bei Yu, David Z. Pan, “Design for Manufacturability with Advanced Lithography”, Springer, 2016.

 

[B1] Bei Yu, David Z. Pan, “Layout Decomposition for Triple Patterning”, in Encyclopedia of Algorithms, M.-Y. Kao eds., Springer, 2015. (paper)


Dissertation

Newsletters

  • [N2] Bei Yu, Gilda Garreton, David Z. Pan, “Layout Compliance for Triple Patterning Lithography: An Iterative Approach”, SPIE Newsroom.