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IEEE
IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems;2020;39;10;10.1109/TCAD.2019.2939329
Convolutional neural networks
generative model
inverse lithography
optical proximity correction
GAN-OPC: Mask Optimization With Lithography-Guided Generative Adversarial Nets
Haoyu Yang
Shuhe Li
Zihao Deng
Yuzhe Ma
Bei Yu
Evangeline F. Y. Young
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