Publications

Summary: IEEE TCAD (34), DAC (22), ICCAD (29), etc.

Journal & Conference Papers

Accepted

  • [J59] Wei Li, Yuzhe Ma, Qi Sun, Lu Zhang, Yibo Lin, Iris Hui-Ru Jiang, Bei Yu, David Z. Pan, “OpenMPL: An Open Source Layout Decomposer”, accepted by IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems (TCAD).

  • [J57] Ran Chen, Wei Zhong, Haoyu Yang, Hao Geng, Fan Yang, Xuan Zeng, Bei Yu, “Faster Region-based Hotspot Detection”, accepted by IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems (TCAD). (code)

2021

  • [C132] Qi Sun, Chen Bai, Tinghuan Chen, Hao Geng, Xinyun Zhang, Yang Bai, Bei Yu, “Fast and Efficient DNN Deployment via Deep Gaussian Transfer Learning”, IEEE International Conference on Computer Vision (ICCV), Oct. 11–17, 2021.

  • [C131] Ruixing Wang, Xiaogang Xu, Chi-Wing Fu, Jiangbo Lu, Bei Yu, Jiaya Jia, “Seeing Dynamic Scenes in the Dark: A High-Quality Video Dataset with Mechatronic Alignment”, IEEE International Conference on Computer Vision (ICCV), Oct. 11–17, 2021.

  • [C130] Jiequan Cui, Zhisheng Zhong, Shu Liu, Bei Yu, Jiaya Jia, “Parametric Contrastive Learning”, IEEE International Conference on Computer Vision (ICCV), Oct. 11–17, 2021.

  • [C129] Yang Bai, Xufeng Yao, Qi Sun, Bei Yu, “AutoGTCO: Graph and Tensor Co-Optimize for Image Recognition with Transformers on GPU”, IEEE/ACM International Conference on Computer-Aided Design (ICCAD), Nov. 1–4, 2021.

  • [C128] Wenqian Zhao, Qi Sun, Yang Bai, Haisheng Zheng, Wenbo Li, Bei Yu, Martin D.F. Wong, “A High-Performance Accelerator for Super-Resolution Processing on Embedded GPU”, IEEE/ACM International Conference on Computer-Aided Design (ICCAD), Nov. 1–4, 2021.

  • [C127] Ran Chen, Shoubo Hu, Zhitang Chen, Shengyu Zhu, Bei Yu, Pengyun Li, Cheng Chen, Yu Huang, Jianye Hao, “A Unified Framework for Layout Pattern Analysis with Deep Causal Estimation”, IEEE/ACM International Conference on Computer-Aided Design (ICCAD), Nov. 1–4, 2021.

  • [C126] Hao Geng, Fan Yang, Xuan Zeng, Bei Yu, “When Wafer Failure Pattern Classification Meets Few-shot Learning and Self-Supervised Learning”, IEEE/ACM International Conference on Computer-Aided Design (ICCAD), Nov. 1–4, 2021.

  • [C125] Binwu Zhu, Ran Chen, Xinyun Zhang, Fan Yang, Xuan Zeng, Bei Yu, Martin D.F. Wong, “Hotspot Detection via Multi-task Learning and Transformer Encoder”, IEEE/ACM International Conference on Computer-Aided Design (ICCAD), Nov. 1–4, 2021.

  • [C124] Guojin Chen, Ziyang Yu, Hongduo Liu, Yuzhe Ma, Bei Yu, “DevelSet: Deep Neural Level Set for Instant Mask optimization”, IEEE/ACM International Conference on Computer-Aided Design (ICCAD), Nov. 1–4, 2021.

  • [C123] Zhuolun He, Ziyi Wang, Chen Bai, Haoyu Yang, Bei Yu, “Graph Learning-Based Arithmetic Block Identification”, IEEE/ACM International Conference on Computer-Aided Design (ICCAD), Nov. 1–4, 2021.

  • [C122] Chen Bai, Qi Sun, Jianwang Zhai, Yuzhe Ma, Bei Yu, Martin D.F. Wong, “BOOM-Explorer: RISC-V BOOM Microarchitecture Design Space Exploration Framework”, IEEE/ACM International Conference on Computer-Aided Design (ICCAD), Nov. 1–4, 2021.

  • [C121] Jianwang Zhai, Chen Bai, Binwu Zhu, Yici Cai, Qiang Zhou, Bei Yu, “McPAT-Calib: A Microarchitecture Power Modeling Framework for Modern CPUs”, IEEE/ACM International Conference on Computer-Aided Design (ICCAD), Nov. 1–4, 2021.

  • [C120] Yifeng Xiao, Miaodi Su, Haoyu Yang, Jianli Chen, Jun Yu, Bei Yu, “Low-Cost Lithography Hotspot Detection with Active Entropy Sampling and Model Calibration”, ACM/IEEE Design Automation Conference (DAC), San Francisco, CA, Dec. 5–9, 2021.

  • [C119] Junzhe Cai, Changhao Yan, Yuzhe Ma, Bei Yu, Dian Zhou, Xuan Zeng, “NeurFill: Migrating Full-Chip CMP Simulators to Neural Networks for Model-Based Dummy Filling Synthesis”, ACM/IEEE Design Automation Conference (DAC), San Francisco, CA, Dec. 5–9, 2021.

  • [C118] Tinghuan Chen, Qi Sun, Bei Yu, “Machine Learning in Nanometer AMS Design for Reliability”, IEEE International Conference on ASIC (ASICON), Kunming, China, Oct. 26–29, 2021. (Invited Paper)

  • [C116] Wei Li, Guojin Chen, Haoyu Yang, Ran Chen, Bei Yu, “Learning Point Clouds in EDA”, ACM International Symposium on Physical Design (ISPD), Mar. 21–Mar. 24, 2021. (paper) (slides) (Invited Paper)

  • [C111] Hongjia Li, Mengshu Sun, Tianyun Zhang, Olivia Chen, Nobuyuki Yoshikawa, Bei Yu, Yanzhi Wang, Yibo Lin, “Towards AQFP-Capable Physical Design Automation”, IEEE/ACM Proceedings Design, Automation and Test in Europe (DATE), Feb. 01–05, 2021. (paper)


  • [J56] Guyue Huang, Jingbo Hu, Yifan He, Jialong Liu, Mingyuan Ma, Zhaoyang Shen, Juejian Wu, Yuanfan Xu, Hengrui Zhang, Kai Zhong, Xuefei Ning, Yuzhe Ma, Haoyu Yang, Bei Yu, Huazhong Yang, Yu Wang, “Machine Learning for Electronic Design Automation: A Survey”, ACM Transactions on Design Automation of Electronic Systems (TODAES), vol. 25, no. 5, 2021. (paper)

2020


2019

  • [C80] Bentian Jiang, Xiaopeng Zhang, Ran Chen, Gengjie Chen, Peishan Tu, Wei Li, Evangeline F. Y. Young, Bei Yu, “FIT: Fill Insertion Considering Timing”, ACM/IEEE Design Automation Conference (DAC), pp. 221:1–221:6, Las Vegas, NV, June 2–6, 2019. (paper) (slides) (poster)


2018


2017

  • [C57] Hang Zhang, Fengyuan Zhu, Haocheng Li, Evangeline F. Y. Young, Bei Yu, “Bilinear Lithography Hotspot Detection”, ACM International Symposium on Physical Design (ISPD), pp. 7–14, Portland, OR, Mar. 19–22, 2017. (paper) (Best Paper Award)


2016


2015


2014

2013


2012

  • [C13] Bei Yu, Jhih-Rong Gao, Duo Ding, Yongchan Ban, Jae-Seok Yang, Kun Yuan, Minsik Cho, David Z. Pan, “Dealing with IC Manufacturability in Extreme Scaling”, IEEE/ACM International Conference on Computer-Aided Design (ICCAD), pp. 240–242, San Jose, CA, Nov. 5–8, 2012. (paper) (Embedded Tutorial paper)


2011

2010

2009



Books / Book Chapters

 

[B3] Shiyan Hu, Bei Yu, “Big Data Analytics for Cyber-Physical Systems”, Springer, 2020.

 

[B2] Bei Yu, David Z. Pan, “Design for Manufacturability with Advanced Lithography”, Springer, 2016.

 

[B1] Bei Yu, David Z. Pan, “Layout Decomposition for Triple Patterning”, in Encyclopedia of Algorithms, M.-Y. Kao eds., Springer, 2015. (paper)


Dissertation

Newsletters

  • [N2] Bei Yu, Gilda Garreton, David Z. Pan, “Layout Compliance for Triple Patterning Lithography: An Iterative Approach”, SPIE Newsroom.