On 25 February 2019, at the SPIE Advanced Lithography Symposium in San Jose, California, Mr. Haoyu Yang was awarded the $10,000 Nick Cobb Memorial Scholarship by SPIE, the international society for optics and photonics, and Mentor Graphics, a Siemens Business, for his contributions to the field related to advanced lithography.

This is the first year for the Nick Cobb scholarship, which is given to an exemplary graduate student working in the field of lithography for semiconductor manufacturing. The award honors the memory of Nick Cobb, who was an SPIE Senior Member and chief engineer at Mentor. His groundbreaking contributions enabled optical and process proximity correction for IC manufacturing.

Mr. Haoyu YANG is currently a 3rd-year PhD student working with Prof. Bei YU in the Department of Computer Science and Engineering, The Chinese University of Hong Kong. His research interests include VLSI design for manufacturability (DFM) and machine learning. He has published several research papers at top VLSI CAD conferences/journals including DAC, ASPDAC and TCAD.